@Article{MirandaUedBalBelFer:2010:TrNaDi,
               author = "Miranda, Claudia Renata Borges and Ueda, Mario and Baldan, 
                         Mauricio Ribeiro and Beloto, Antonio Fernando and Ferreira, 
                         Neidenei Gomes",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais 
                         (INPE)}",
                title = "Treatment of nanocrystalline diamond films by nitrogen 
                         implantation using PIII processing",
              journal = "Surface and Coatings Technology",
                 year = "2010",
               volume = "204",
               number = "18-19",
                pages = "3034--3038",
                month = "June",
                 note = "The Tenth International Workshop on Plasma-Based Ion Implantation 
                         and Deposition, S{\~a}o Jos{\'e} dos Campos, SP, Brazil and 
                         {07-11 September 2009 Edited by Joaquim J. Barroso and Mario 
                         Ueda}",
             keywords = "Ion implantation technology, Diamond, Electrochemical 
                         properties.",
             abstract = "The influence of N2 Plasma Immersion Ion Implantation (PIII) on 
                         undoped nanocrystalline diamond (NCD) films grown on silicon 
                         substrate by CVD process using a hot filament reactor was 
                         systematically studied. Before and after the implantation, NCD 
                         films were investigated using scanning electron microscopy (SEM), 
                         high resolution X-ray diffraction (HRXRD) and Raman scattering 
                         spectroscopy. Significant changes in the film surface morphologies 
                         due to the plasma implantation treatment were observed. The NCD 
                         morphology changed from cauliflower-like to a smoother surface 
                         after the nitrogen-plasma immersion. The Raman spectra are similar 
                         for the three kind of electrodes before and after PIII of 15 and 
                         30 min. Although a small difference among the ratios concerning 
                         the D and G Raman band intensities (ID/IG) may be observed that 
                         seems to increase after the plasma treatment, associated to the 
                         disorder increase caused by nitrogen incorporation in the sp2 
                         phase. Electrochemical response also showed that implanted NCD 
                         films had their electrical conductivity improved while the 
                         electron transfer kinetics decreased for such NCD films after 15 
                         and 30 min of N2 implantation.",
                  doi = "10.1016/j.surfcoat.2010.02.051",
                  url = "http://dx.doi.org/10.1016/j.surfcoat.2010.02.051",
                 issn = "0257-8972",
                label = "lattes: 3374288398505199 1 MirandaUedBalBelFer:2010:TrNaDi",
             language = "en",
           targetfile = "miranda.pdf",
        urlaccessdate = "02 maio 2024"
}